Processing - Electron Beam Nanolithography



EBL Rates

CEDT Members
(CEDT cover charge paid)
Instrument Time: $50/hr
(payable directly to BIMR)
EBL Instructional Time: Free
DesignCAD Sessions: $10/hr

CEDT Associates
(no cover charge paid)
Instrument Time: $100/hr
($50 to the CEDT, and $50 payable directly to BIMR)
EBL Instructional Time: Free
DesignCAD Sessions: $10/hr

Contract Work
EBL work can be contracted to the CEDT at $150/hr ($100/hr CEDT contract rate, plus $50/hr BIMR SEM rate).

Please provide an account number to CEDT staff at your first EBL session.

The CEDT operates a Nano Pattern Generation System (NPGS) e-beam lithography (EBL) system. The system is capable of imprinting patterns into PMMA resist materials that have been spun on to semiconductor substrates. Features with resolution of 30 nm or smaller can be achieved.

The CEDT's NPGS module is incorporated into a JEOL JSM 7000F scanning electron microscope, which provides the electron beam optics necessary for lithographic pattern generation.

The EBL Process

The NPGS nanolithography technique involves the following steps:

  • pattern design (DesignCAD)
  • sample preparation (PMMA resist deposition and baking)
  • lithographic imprinting
  • resist development and masking
  • follow-up assessment (imaging via SEM)

To arrange an EBL session or to discuss a project visit our EBL Technical Information site.